1-Methoxy-2-propyl acetate CAS Number 108-65-6

Propylene glycol methyl ether acetate (PGMEA), also known as propylene glycol monomethyl ether acetate, has a molecular formula of C6H12O3. It is a colorless hygroscopic liquid with a special odor and is a non polluting solvent with multiple functional groups. Mainly used as a solvent for ink, paint, ink, textile dyes, and textile oils, it can also be used as a cleaning agent in the production of LCD displays. Flammable, may form explosive vapor/air mixtures above 42 ° C.
Product Name: Propylene Glycol Methyl Ether Acetate
Foreign name: 2-Acetyloxy-1-methoxypropane
Alias: Propylene glycol monomethyl ether acetate
Chemical formula: C6H12O3
Molecular weight: 132.158
CAS login number: 108-65-6
EINECS login number: 203-603-9
Melting point: -87 ℃
Water solubility: soluble
Density: 0.96 g/cm ³
Appearance: Colorless and transparent liquid
Flash point: 47.9 ℃
Application: It is an indispensable auxiliary solvent in the coating industry to improve the strength of coatings.
Security description: S25; S45；S53
Hazard symbol: T; Xi
Hazard description: R10; R36；R61
UN Dangerous Goods Number: 3271
application
In the paint industry, as a diluent and leveling agent, it helps to improve the coating properties, fluidity, and adhesion of the paint, making it easier to apply and use. Almost all fiber and resin varnishes and latex use propylene glycol methyl ether acetate as a solvent. For example, it can be widely used in high-end paints such as car paint, TV paint, refrigerator paint, airplane paint, etc.
In the field of plastics, as a plasticizer, it helps to improve the flexibility, ductility, and strength of plastics, making them more suitable for various application areas.
3. It can be used as a solvent for ink, textile dyes, textile oils, and also as a cleaning agent in the production of liquid crystal displays.
4. Can be used for TFT-LCD photoresist thinner, photoresist remover, stripping agent, IC cleaning agent, photoresist buffer, etching process, and other chemical products that require special specifications in the photoresist production process.
In the leather industry, as a solvent for blending agents, it can improve the softness of leather and maintain good gloss.
In the field of chemical products, it can be used as a solvent for synthetic resins, cellulose ethers, polyurethane, etc., which helps to improve the transparency, flexibility, durability and other properties of products.